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Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
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Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Published on: December 16, 2011

Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective

Aránzazu del Campo1, Diana Boos, Hans Wolfgang Spiess

  • 1Max-Planck-Institut für Polymerforschung, Ackermannweg 10, 55128 Mainz, Germany.

Angewandte Chemie (International Ed. in English)
|July 5, 2005
PubMed
Abstract

No abstract available in PubMed .

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