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Published on: February 27, 2015
Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates
Joaquín Cortés1, Eliana Valencia
1Facultad de Ciencias Físicas y Matemáticas, Universidad de Chile, Casilla, Santiago, 2777, Chile. jcortes@dqb.uchile.cl
Journal of Colloid and Interface Science
|November 18, 2005
Abstract:
A study is made by means of Monte Carlo (MC) simulations of the kinetics of random sequential adsorption (RSA) of dimers and linear and bent trimers on some geometrically disordered substrates. The MC data are explained by a semiempirical equation whose parameters interpret the jamming fraction of the process and some geometric characteristics of the systems studied.