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Reactive Vapor Deposition of Conjugated Polymer Films on Arbitrary Substrates
Published on: January 17, 2018
Self-assembly in evaporated polymer solutions: influence of the solution concentration
Edward Bormashenko1, Roman Pogreb, Albina Musin
1The College of Judea and Samaria, The Research Institute, 44837 Ariel, Israel. edward@yosh.ac.il
Polymer solution concentration dictates the size of self-assembled mesoscopic patterns. Pattern dimensions scale linearly with concentration, explained by mass transport instability during solvent evaporation.
Area of Science:
- Materials Science
- Polymer Science
- Physical Chemistry
Background:
- Self-assembly of polymers is crucial for creating ordered materials.
- Understanding pattern formation during solvent evaporation is key for material design.
- Existing methods lack control over mesoscopic pattern dimensions.
Purpose of the Study:
- To investigate the formation of self-assembled mesoscopic patterns from amorphous polymers.
- To determine the influence of polymer solution concentration on pattern characteristics.
- To elucidate the underlying physical mechanism of pattern formation.
Main Methods:
- Dissolving amorphous polymers in chlorinated organic solvents.
- Depositing and evaporating solutions under controlled ambient conditions.
- Analyzing pattern morphology using optical microscopy and atomic force microscopy (AFM).
- Conducting in situ Fourier-transform infrared (FTIR) spectroscopy to study the evaporation process.
Main Results:
- Self-assembled, oriented, mesoscopic patterns were successfully formed.
- Polymer solution concentration significantly influences the characteristic dimensions of the mesoscopic cells.
- Cell dimensions exhibited a linear growth with increasing polymer solution concentration.
- FTIR analysis ruled out water droplet condensation as the cause of film porosity.
Conclusions:
- Polymer solution concentration is a critical factor controlling mesoscopic pattern dimensions.
- The observed linear scaling is explained by mass transport instability during rapid solvent evaporation.
- This study provides a method for controlling mesoscopic pattern formation in polymer films.
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