New types of unstable step-flow growth on Si(111)-(7 x 7) during molecular beam epitaxy: scaling and universality

Hiroo Omi1, Yoshikazu Homma, Vesselin Tonchev

  • 1NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya Atsugi, Kanagawa 243-0198, Japan. homi@will.brl.ntt.co.jp

Physical Review Letters
|December 31, 2005
PubMed