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Updated: Aug 11, 2026
Writing and Low-Temperature Characterization of Oxide Nanostructures
Published on: July 18, 2014
Nanolithographic write, read, and erase via reversible nanotemplated nanostructure electrodeposition on
1Department of Chemistry, Temple University, Philadelphia, Pennsylvania 19122, USA.
Abstract:
A write, read, and erase nanolithographic method, combining in situ electrodeposition of metal nanostructures with atomic force microscopy (AFM) nanoshaving of a 1-hexadecanethiol (HDT) self-assembled monolayer (SAM) on Au(111) in an aqueous solution, is reported. The AFM tip defines the local positioning of nanotemplates via the irreversible removal of HDT molecules. Nanotemplates with lateral dimensions as narrow as 25 nm are created. The electroactive nanotemplates determine the size, shape, and position of the metal nanostructures. The potential applied to the substrate controls the amount of metal deposited and the kinetics of the deposition. Metal nanostructures can be reversibly and repeatedly electrodeposited and stripped out of the nanotemplates by applying appropriate potentials.
