Integrated optical filter arrays fabricated by using the combinatorial etching technique
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Published on: July 18, 2015
Shao-Wei Wang1, Xiaoshuang Chen, Wei Lu
1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, China. wangshw@mail.sitp.ac.cn
Abstract:
A combinatorial etching technique is developed to fabricate integrated narrow bandpass filters on a single substrate. It is highly efficient for fabrication of integrated filter arrays in optical regions. A monolithic filter array has been fabricated by using the technique with a two-step deposition process. The filter contains 32 elements in the near-infrared region. The relative full width at half-maximum (FWHM) sigmalambda/lambda of the filter elements is less than 0.2%. Such a narrow bandpass filter array can be utilized in many optical applications.
