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Integrated optical filter arrays fabricated by using the combinatorial etching technique.

Shao-Wei Wang1, Xiaoshuang Chen, Wei Lu

  • 1National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, China. wangshw@mail.sitp.ac.cn

Optics Letters
|February 17, 2006
PubMed
Summary

A new combinatorial etching method efficiently fabricates integrated narrow bandpass filters. This technique produces a 32-element filter array with a relative spectral width under 0.2%, ideal for optical applications.

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Area of Science:

  • Optics and Photonics
  • Materials Science

Background:

  • Integrated optical filters are crucial for various photonic applications.
  • Existing fabrication methods can be complex and inefficient for creating filter arrays.

Purpose of the Study:

  • To develop an efficient combinatorial etching technique for fabricating integrated narrow bandpass filters.
  • To demonstrate the fabrication of a monolithic filter array using this novel technique.

Main Methods:

  • A combinatorial etching technique was developed.
  • A two-step deposition process was employed.
  • A monolithic filter array with 32 elements was fabricated.

Main Results:

  • The technique is highly efficient for fabricating integrated filter arrays.

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  • The fabricated filter array operates in the near-infrared region.
  • The relative full width at half-maximum (FWHM) of the filter elements is less than 0.2%.

    • Conclusions:

    • The combinatorial etching technique provides an efficient method for creating narrow bandpass filter arrays.
    • The developed filter array exhibits narrow spectral characteristics.
    • This technology has potential for diverse optical applications requiring precise spectral filtering.