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Low-loss one-dimensional photonic bandgap filter in (110) silicon
1Optical and Semiconductor Devices Group, Department of Electrical and Electronic Engineers, Imperial College London, UK.
Abstract:
A free-space silicon one-dimensional photonic bandgap optical filter is designed and fabricated. A two-stage (110) wafer etching process is employed to form the extremely vertical, smooth, and high-aspect-ratio features that are essential for good optical properties. The (111) oriented planes of the wafer form <0.01 degrees off-vertical trenches that make up the Fabry-Perot filter. A simulation model is presented that analyzes the effect of verticality and predicts the measured spectrum well.
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