Related Experiment Video
Updated: Aug 10, 2026
06:30
Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition
Published on: August 29, 2017
Ultra-low-stress thin-film interference filters
Georg J Ockenfuss1, Robert E Klinger
1JDS Uniphase, 2789 Northpoint Parkway, Santa Rosa, California 95407, USA. georg.ockenfuss@jdsu.com
Applied Optics
|March 17, 2006
Summary
A new method releases thin-film filters from their substrates, reducing optical degradation caused by coating stress. This technique successfully demonstrates a complex 8-skip-0 100 GHz wavelength-division-multiplexing band-splitting filter.
Area of Science:
- Optics and Photonics
- Materials Science
- Optical Engineering
Background:
- Coating stress in thin-film filters can degrade optical performance.
- Releasing filters from substrates is a potential method to mitigate stress effects.
Purpose of the Study:
- To describe a novel method for reducing optical degradation in thin-film filters by substrate release.
- To demonstrate the efficacy of this method using a challenging filter design.
Main Methods:
- A technique to release a deposited thin-film filter from its substrate was developed.
- An 8-skip-0 100 GHz wavelength-division-multiplexing band-splitting filter was fabricated using this method.
Main Results:
- The substrate-release method effectively reduces optical degradation caused by coating stress.
- A high-performance 8-skip-0 100 GHz WDM band-splitting filter was successfully demonstrated.
Conclusions:
- The substrate-release technique is a viable approach to improve the optical performance of thin-film filters.
- This method enables the fabrication of complex filters, such as the demonstrated 100 GHz WDM band-splitting filter, with reduced optical distortion.
