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Ion-assisted deposition of TiO2/SiO2 multilayers for mass production
Bin Fan1, Masahiro Suzuki, Ken Tang
1Optorun Co., Ltd., 10-1 Takeno, Kawagoe City, Saitama 350-0801, Japan. bin_fan@optorun.co.jp
Applied Optics
|March 17, 2006
Abstract:
The optical and microstructural properties of filters composed of TiO2 and SiO2 multilayers deposited by different ion-assisted-deposition (IAD) parameters were investigated. The proper IAD coating conditions for mass-produced, environmentally stable, low-scattering, and low-absorption TiO2/SiO2 multilayers were obtained after comparison of these filters.
