Bias-assisted in vitro calcification of calcium disilicide growth layers on spark-processed silicon

A dry-etch spark ablation method was used to produce calcium disilicide (CaSi2/Si) layers on silicon (Si) surfaces for the electrochemical growth of apatitic phosphates (calcium phosphate, CaP). CaSi2/Si composite electrodes readily calcify in vitro under the application of a small electric potential, and with proper treatment, the electrodeposition of CaP is localized to the sparked areas. In addition to increasing the local concentration of calcium, interfacial layers of CaSi2 on Si exhibit exceptional site selectivity towards CaP formation under bias due to the difference in conductivity between Si and CaSi2. The proposed mechanism for bias-assisted biomineralization of CaSi2/Si layers on spark-processed Si accounts for the physicochemical properties of deposited CaP films. This work also describes routes to surface modification of calcified composite electrodes with medicinally relevant compounds such as alendronate and norfloxacin. To assess the suitability of this material as a drug-delivery platform, release of the latter compound was also monitored as a function of time.