J-aggregation in alpha-sexithiophene submonolayer films on silicon dioxide

Enrico Da Como1, Maria Antonietta Loi, Mauro Murgia

  • 1Istituto per lo Studio dei Materiali Nanostrutturati (ISMN), Consiglio Nazionale delle Ricerche, Bologna, Italy. e.dacomo@bc.ismn.cnr.it

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