Enabling gate dielectric design for all solution-processed, high-performance, flexible organic thin-film transistors

Ping Liu1, Yiliang Wu, Yuning Li

  • 1Materials Design & Integration Laboratory, Xerox Research Centre of Canada, Mississauga, Ontario, Canada.

Summary

Researchers developed a stable dual-layer gate dielectric for solution-processed organic thin-film transistors. This innovation enables high-performance flexible electronics fabricated entirely from solution-processable materials.

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