Negative ion behavior in single- and dual-frequency plasma etching reactors: particle-in-cell/Monte Carlo collision

V Georgieva1, A Bogaerts

  • 1PLASMANT Research Group, Department of Chemistry, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk-Antwerp, Belgium. violeta.georgieva@ua.ac.be

Summary

Particle-in-cell/Monte Carlo simulations reveal distinct negative ion behaviors in radio-frequency discharges. In dual-frequency systems, F- ions can be lost at electrodes, unlike heavier CF3- ions confined to the plasma bulk.