A Double Multilayer Monochromator at an ESRF Undulator for Microbeam Experiments.

Area of Science:

• Materials Science
• Optics
• Synchrotron Radiation

Background:

• High-brilliance synchrotron radiation sources require advanced optics for beam manipulation.
• Multilayer monochromators are crucial for selecting specific photon energies from broadband synchrotron beams.

Purpose of the Study:

• To evaluate the performance of a water-cooled W/Si-multilayer monochromator.
• To assess the characteristics of the generated X-ray microbeam for potential applications.

Main Methods:

• Operation of a double W/Si-multilayer monochromator at the ESRF undulator beamline.
• Measurement of peak power density and flux density of the first-order Bragg reflection (~8 keV).
• Testing the microbeam diffraction performance on a 20 µm tungsten wire.

Main Results:

• The monochromator achieved a peak power density of ~1 W/mm².
• A flux density of 4 x 10⁵ photons s⁻¹ µm⁻² mA⁻¹ was measured after a 10 µm collimator.
• Pseudo-Laue diffraction patterns were observed and analyzed in relation to the multilayer spectrum.

Conclusions:

• The water-cooled W/Si-multilayer monochromator is effective for generating high-flux X-ray microbeams.
• The system demonstrates suitability for microbeam diffraction studies on small samples.
• Further analysis of the multilayer spectrum is needed for complete understanding of the diffraction patterns.