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Updated: Aug 7, 2026

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Fabrication of Bi2Te3 and Sb2Te3 Thermoelectric Thin Films using Radio Frequency Magnetron Sputtering Technique
Published on: May 17, 2024
Optical properties of fluoride thin films deposited by RF magnetron sputtering
Koichiro Iwahori1, Masahiro Furuta, Yusuke Taki
1Department of Lens Engineering Development, Production Technology Headquarters, Core Technology Center, Nikon Corporation, Japan. iwahori.k@nikon.co.jp
Applied Optics
|June 27, 2006
Abstract:
Fluoride thin films for 193-nm lithography were deposited by three different types of RF magnetron sputtering. Systematic analysis of the relation between optical properties and deposition conditions of these thin films is discussed.

