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Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
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Dissociation of sulfur dioxide by ultraviolet multiphoton absorption between 224 and 232 nm

Amitavikram A Dixit1, Yuxiu Lei, Keon Woo Lee

  • 1Department of Chemistry and Chemical Biology, Cornell University, Ithaca, New York 14853, USA.

The Journal of Physical Chemistry. A
|July 13, 2006
PubMed

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