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Atomic structure and bonding of water overlayer on Cu(110): the borderline for intact and dissociative adsorption
1Department of Physics, Sichuan Normal University, Chengdu 610068, China.
Abstract:
By carefully comparing the calculated and measured work function data, energetics, and vibrational spectroscopy, we determine explicitly the water structure in c(2 x 2) periodicity on Cu(110) to be an intact water overlayer with a majority component of H-down bilayer (95%) in low temperature experiments. Water dissociation is accessible by heating or ultraviolet illumination, resulting in a sensitive change in electron density at the surface and could therefore be monitored by work function measurement.
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