Influence of polymer molecular weight on the chemical modifications induced by UV laser ablation

This paper investigates the influence of polymer molecular weight (M(W)) on the chemical modifications of poly(methyl methacrylate), PMMA, and polystyrene, PS, films doped with iodonaphthalene (NapI) and iodophenanthrene (PhenI), following irradiation at 248 nm (KrF excimer laser, 20 ns fwhm and hybrid excimer-dye laser, 500 fs fwhm) and at 308 nm (XeCl excimer laser, 30 ns fwhm). The changes of intensity and position of the polymer Raman bands upon irradiation provide information on cleavage of the polymer bonds. Degradation of PMMA, which is a weak absorbing system at 248 nm, occurs to a higher extent in the case of a larger M(W), giving rise to the creation of unsaturation centers and to degradation products. For highly absorbing PS, no degradation is observed upon irradiation with a KrF laser. Consistently irradiating doped PS at 308 nm, where the absorption is low, induces degradation of the polymer. Results provide direct support for the bulk photothermal model, according to which ejection requires a critical number of broken bonds. In the case of irradiation of doped PMMA with pulses of 248 nm and 500 fs, neither degradation nor dependence with polymer M(W) are observed, indicating that mechanisms involved in the femtosecond laser ablation differ from those operating in the case of nanosecond laser ablation. Participation of multiphoton/avalanche processes is proposed.