Adsorption behavior and activity of hexokinase

S M Pancera1, H Gliemann, Th Schimmel

  • 1Institut für Nanotechnologie, Forschungszentrum Karlsruhe GmbH, D-76021 Karlsruhe, Germany.

Summary

Hexokinase (HK) forms a stable monolayer on silicon wafers, retaining enzymatic activity. This adsorption is favored by low ionic strength, suggesting electrostatic forces drive the process.

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