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Updated: Jul 20, 2026

Digital Inline Holographic Microscopy (DIHM) of Weakly-scattering Subjects
Published on: February 8, 2014
Effect of spurious diffraction orders in arbitrary multifoci patterns produced via phase-only holograms.
Darwin Palima1, Vincent Ricardo Daria
1National Institute of Physics, University of the Philippines, Diliman, Philippines.
Spurious diffraction orders reduce the efficiency of multifoci patterns generated by phase-only holograms. This light loss to unwanted orders limits the practical applications of arbitrary multifoci generation.
Area of Science:
- Optics and Photonics
- Holography
- Diffraction Theory
Background:
- Phase-only holograms are used to generate multifoci patterns.
- Illuminating holograms with Gaussian beams can lead to spurious diffraction orders.
Purpose of the Study:
- To analyze the impact of spurious diffraction orders on multifoci pattern generation.
- To quantify light loss to unwanted diffraction orders.
Main Methods:
- Analysis of light distribution from phase-only holograms illuminated by Gaussian beams.
- Investigation of practical hologram encoding devices.
Main Results:
- Undesirable zero and high-diffraction orders are generated at the Fourier plane.
- A significant fraction of incident light is lost to spurious orders, not functional patterns.
- Shifting foci patterns off-axis to avoid zero order increases light distribution to higher spurious orders.
Conclusions:
- Spurious diffraction orders are a major limiting factor for applications utilizing arbitrary multifoci patterns.
- Efficient generation of multifoci patterns requires mitigation of light loss to unwanted diffraction orders.
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