Nanoscale patterning on insulating substrates by critical energy electron beam lithography

Jaebum Joo1, Brian Y Chow, Joseph M Jacobson

  • 1The Center for Bits and Atoms, MIT Media Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.

Nano Letters
|September 14, 2006
PubMed
Summary

This study introduces critical energy electron beam lithography to create nanometer patterns on insulators, eliminating charging issues. This technique enables precise patterning for advanced electronics without complex equipment.

Related Concept Videos