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Updated: Jul 20, 2026

Analysis of Contact Interfaces for Single GaN Nanowire Devices
Published on: November 15, 2013
Realization of a linear germanium nanowire p-n junction
Emanuel Tutuc1, Joerg Appenzeller, Mark C Reuter
1I.B.M. TJ Watson Research Center, Yorktown Heights, New York 10598, USA.
Abstract:
Germanium nanowires grown by chemical vapor deposition exhibit a peculiar dopant incorporation mechanism. The dopant atoms, such as boron and phosphorus, get incorporated through the wire surface, a mechanism which limits the doping modulation along the wire length, and therefore the fabrication of more elaborate structures that combine both n- and p-type doping. Using a novel device design that circumvents these constraints, we demonstrate here a linear Ge nanowire p-n junction.
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