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High-efficiency collector design for extreme-ultraviolet and x-ray applications
1Media Lario Technologies, Località Pascolo, 23842 Bosisio Parini (LC), Italy. fabio.zocchi@media-lario.com
Applied Optics
|November 23, 2006
Summary
This study introduces a novel two-reflection mirror design for grazing-incidence optics, optimizing reflectivity by equalizing angles. This innovation enhances collection efficiency for extreme-ultraviolet microlithography applications.
Area of Science:
- Optics and Photonics
- Lithography Technology
Background:
- Extreme-ultraviolet (EUV) microlithography requires efficient collection of radiation from plasma sources.
- Nonimaging collector optics are crucial for focusing this radiation onto illuminator optics.
Purpose of the Study:
- To propose a novel two-reflection mirror design for nested grazing-incidence optics.
- To maximize overall reflectivity for enhanced radiation collection and focusing.
Main Methods:
- Designing a two-reflection mirror system with equal grazing-incidence angles for each ray.
- Analyzing the optical performance for nonimaging collector applications in EUV microlithography.
Main Results:
- Achieved maximum overall reflectivity by ensuring equal grazing-incidence angles for all rays.
- Demonstrated the design's suitability for collecting and focusing plasma-emitted radiation.
Conclusions:
- The proposed two-reflection mirror design offers a significant improvement in reflectivity for EUV microlithography.
- The design principles are also adaptable for x-ray applications with objects at infinity.
