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Updated: Jul 18, 2026
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The Synthesis, Characterization and Reactivity of a Series of Ruthenium N-triphosPh Complexes
Published on: April 10, 2015
Growth of ultrathin films of amorphous ruthenium-phosphorus alloys using a single source CVD precursor
Jinhong Shin1, Abdul Waheed, Kyriacos Agapiou
1Texas Materials Institute, University of Texas at Austin, Austin, TX 78750, USA.
Journal of the American Chemical Society
|December 21, 2006
Abstract:
Thin films ( approximately 30 nm) of amorphous RuP alloys (P approximately 15-20%) can be grown by CVD from the single source precursor cis-H2Ru(PMe3)4 at 250-300 degrees C and 200 mTorr pressure on native SiO2.
