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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

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Stoichiometry and valence measurements of niobium oxides using electron energy-loss spectroscopy

M J Olszta1, J Wang, E C Dickey

  • 1Department of Materials Science and Engineering, Center for Dielectric Studies and The Materials Research Institute, 208 MRL Building, Pennsylvania State University, University Park, Pennsylvania 16802, USA.

Journal of Microscopy
|January 11, 2007
PubMed

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