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Sequential addition of H2O, CH3OH, and NH3 to Al3O3-: a theoretical study

Alfredo Guevara-García1, Ana Martínez, J V Ortiz

  • 1Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Circuito Exterior sin número, Ciudad Universitaria, P.O. Box 70-360, Coyoacán, 04510 Distrito Federal, México. aagg13@gmail.com

The Journal of Chemical Physics
|January 19, 2007
PubMed

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