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Wavefront error measurement of high-numerical-aperture optics with a Shack-Hartmann sensor and a point source
Jin-Seok Lee1, Ho-Soon Yang, Jae-Won Hahn
1School of Mechanical Engineering, Yonsei University, Seoul, Korea. jsrace@yonsei.ac.kr
Abstract:
We developed a new, to the best of our knowledge, test method to measure the wavefront error of the high-NA optics that is used to read the information on the high-capacity optical data storage devices. The main components are a pinhole point source and a Shack-Hartmann sensor. A pinhole generates the high-NA reference spherical wave, and a Shack-Hartmann sensor constructs the wavefront error of the target optics. Due to simplicity of the setup, it is easy to use several different wavelengths without significant changes of the optical elements in the test setup. To reduce the systematic errors in the system, a simple calibration method was developed. In this manner, we could measure the wavefront error of the NA 0.9 objective with the repeatability of 0.003 lambda rms (lambda = 632.8 nm) and the accuracy of 0.01 lambda rms.

