Sheng Wang1, David F P Pile, Cheng Sun
1National Science Foundation Nanoscale Science and Engineering Center (NSEC), 5130 Etcheverry Hall, University of California, Berkeley, California 94720-1740, USA.
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A novel electron-beam lithography technique fabricates high-aspect ratio nanopin arrays. These arrays exhibit tunable optical properties and electromagnetic interplay, enabling ultrasensitive chemical sensing applications.
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