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In Situ Time-dependent Dielectric Breakdown in the Transmission Electron Microscope: A Possibility to Understand the Failure Mechanism in Microelectronic Devices
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Study of the influence of the dielectric layer thickness in a CNT-FED

Xing Su1, Lifang Zhang, Wei Lei

  • 1Department of Electronic Engineering, Southeast University, Nanjing 210096, People's Republic of China.

Ultramicroscopy
|April 3, 2007
PubMed

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