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Related Experiment Videos

Nanoparticle scanning and detection on flat and structured surfaces using fluorescence microscopy.

Rasim Guldiken1, Prashanth Makaram, Kaveh Bakhtari

  • 1NSF Nanoscale Science and Engineering Center for High-rate Nanomanufacturing, Northeastern University, Boston, Massachusetts 02115, USA.

Microscopy Research and Technique
|May 8, 2007
PubMed
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A novel fluorescence microscopy technique enables nanoscale particle detection for quality control in semiconductor manufacturing. This method accurately counts particles down to 63 nm on various surfaces and in deep trenches.

Area of Science:

  • Materials Science
  • Optical Engineering
  • Nanotechnology

Background:

  • Accurate nanoparticle detection is critical for quality control in high-tech manufacturing.
  • Existing methods face challenges in detecting small particles on complex surfaces.

Purpose of the Study:

  • To introduce a new fluorescence microscopy technique for scanning and detecting nanoparticles.
  • To enable precise particle removal measurements in semiconductor and hard disk manufacturing.

Main Methods:

  • Utilizing fluorescence microscopy for scanning flat substrates and 3D structures.
  • Developing a technique for nanoscale particle detection and counting.

Main Results:

  • Demonstrated detection and counting of single nanoparticles down to 63 nm.

Related Experiment Videos

  • Successfully detected particles within trenches as deep as 500 micrometers.

    • Conclusions:

    • The proposed fluorescent particle scanning technique offers high sensitivity for nanoparticle detection.
    • This method is valuable for particle contamination monitoring and process control in advanced manufacturing.