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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used.
Atomic Emission Spectroscopy: Instrumentation01:22

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The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...

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Updated: Jul 14, 2026

Characterization of Surface Modifications by White Light Interferometry: Applications in Ion Sputtering, Laser Ablation, and Tribology Experiments
11:47

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Published on: February 27, 2013

Differential sputter yield measurements using cavity ringdown spectroscopy.

Vijay Surla1, Azer P Yalin

  • 1Department of Mechanical Engineering, Colorado State University, Fort Collins, Colorado 80523, USA.

Applied Optics
|June 16, 2007
PubMed
Summary

Cavity ringdown spectroscopy (CRDS) now measures sputter yield profiles. This technique, using spatial scanning and modeling, accurately characterizes particle distribution from sputtering targets.

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Area of Science:

  • Physics
  • Materials Science
  • Spectroscopy

Background:

  • Cavity Ring-Down Spectroscopy (CRDS) is a sensitive absorption technique.
  • Measuring differential sputter yield profiles is crucial for understanding thin-film deposition and surface modification.
  • Previous methods for sputter yield profiling had limitations.

Purpose of the Study:

  • To report the first application of CRDS for measuring differential sputter yield profiles.
  • To develop and validate a method combining CRDS with spatial scanning and modeling for sputter yield analysis.

Main Methods:

  • Utilized CRDS by scanning the optical axis relative to the sputtered particle source.
  • Measured the spatial profile of CRDS signals.
  • Employed modeling techniques to invert the CRDS data and determine the differential sputter yield profile.

Main Results:

  • Successfully measured differential sputter yield profiles using CRDS.
  • Demonstrated the technique with 750 eV argon ions incident on a molybdenum target.
  • Observed an under-cosine sputtering distribution (alpha = 0.22 +/- 0.07), consistent with prior quartz crystal microbalance measurements.

Conclusions:

  • CRDS is a viable and effective method for characterizing differential sputter yield profiles.
  • The developed CRDS-based approach provides accurate insights into particle distribution during sputtering.
  • This technique advances the understanding of sputtering processes relevant to materials science and thin-film technologies.