In situ sensitive optical monitoring with proper error compensation

We introduce a way to estimate the fluctuation of the refractive index during thin film deposition, through an optical monitor. The thicknesses and error-compensated thickness for each layer are analyzed. A novel monitoring method is thereby derived. The revised refractive index and the choice of highly sensitive monitoring wavelengths help us predict the termination points more accurately. The performance of a narrow-bandpass filter monitored by this method is demonstrated.