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Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
Published on: July 21, 2018
Compact ellipsometer employing a static polarimeter module with arrayed polarizer and wave-plate elements
Takashi Sato1, Takeshi Araki, Yoshihiro Sasaki
1Photonic Lattice, Inc., Aoba Incubation Square, Aoba, Aramaki, Aoba-ku, Sendai 980-0845, Japan. sato@photonic-lattice.com
Applied Optics
|August 7, 2007
Summary
A new portable ellipsometer utilizes a compact static polarimeter for rapid, repeatable measurements of thin silicon dioxide films. This technology offers potential for integration into manufacturing equipment.
Area of Science:
- Optical Engineering
- Materials Science
- Metrology
Background:
- Ellipsometry is a crucial technique for characterizing thin films.
- Existing ellipsometers can be bulky and expensive, limiting their application in manufacturing.
- There is a need for compact, fast, and repeatable ellipsometry solutions.
Purpose of the Study:
- To develop a portable and compact ellipsometer module.
- To demonstrate high repeatability and measurement speed.
- To assess the potential for integration into manufacturing equipment.
Main Methods:
- Development of a portable static polarimeter.
- Utilizing an arrayed polarizer, arrayed wave plate, and CCD image sensor.
- Measurement of silicon dioxide (SiO2) films on silicon (Si) wafers.
Main Results:
- Achieved a high level of repeatability in measurements.
- Demonstrated a fast measurement speed of 0.3 seconds.
- Successfully measured SiO2 films with thicknesses ranging from 2 to 300 nm.
Conclusions:
- The developed portable ellipsometer with a compact static polarimeter is effective for thin film characterization.
- The system exhibits excellent repeatability and speed, suitable for industrial applications.
- Integration of optical source and receiver can lead to an ultracompact module for diverse manufacturing and measurement instruments.
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