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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used.
Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.

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Updated: Jul 13, 2026

How to Ignite an Atmospheric Pressure Microwave Plasma Torch without Any Additional Igniters
08:42

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Published on: April 16, 2015

A simple method for measuring plasma power in rf-GDOES instruments.

T Nelis1, M Aeberhard, L Rohr

  • 1EMPA Materials Science and Technology, Feurwerkerstrasse 39, 3602 Thun, Switzerland. thomas.nelis@empa.ch

Analytical and Bioanalytical Chemistry
|August 7, 2007
PubMed
Summary

This study introduces a new method to measure plasma power in radio frequency-Glow Discharge Optical Emission Spectrometry (rf-GDOES). The technique uses effective resistance in the inductive coil to accurately determine power consumption in the matching system.

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Published on: August 1, 2017

Area of Science:

  • Plasma Physics
  • Spectroscopy
  • Electrical Engineering

Background:

  • Radio Frequency-Glow Discharge Optical Emission Spectrometry (rf-GDOES) is a powerful surface analysis technique.
  • Accurate determination of plasma power is crucial for reliable GDOES analysis.
  • Existing methods may not fully account for power losses in the impedance matching system.

Purpose of the Study:

  • To present a novel method for calculating plasma power in rf-GDOES.
  • To improve the accuracy of power determination by considering the impedance matching system.
  • To experimentally validate the proposed power calculation method.

Main Methods:

  • The method is based on calculating the effective resistance within the inductive coil of the impedance matching system.
  • It accounts for electrical power consumed in the matching system, influenced by capacitive current.
  • The capacitive current is determined by applied voltage, stray capacitance, and frequency.

Main Results:

  • The proposed method provides a more accurate measurement of plasma power compared to integral calculations.
  • Experimental evaluation demonstrates the effectiveness of the correction method.
  • The study quantifies the impact of matching system parameters on power consumption.

Conclusions:

  • The developed method offers a more precise way to determine plasma power in rf-GDOES.
  • Accurate power measurement is essential for optimizing GDOES performance and data interpretation.
  • This approach enhances the reliability and accuracy of the rf-GDOES technique.