Effect of lateral morphology formation of polymer blend towards patterning silane-based SAMs using selective dissolution method

A number of strategies have been developed including soft lithography and photolithography for patterning various surfaces. Here we have discussed a customized strategy for surface patterning of nanosized, silane-based SAMs and monolayer thickness measurement investigated using atomic force microscope (AFM). We have utilized the versatile morphology of a binary polymer blend to generate patterned SAMs over silicon substrate by employing a selective dissolution procedure. This method was confirmed with different organosilanes with varying number of C-atoms and to other polymer blend. The samples were imaged both in tapping mode and pulsed force mode AFM.