Mechanism of water photooxidation reaction at atomically flat TiO2 (rutile) (110) and (100) surfaces: dependence on

Akihito Imanishi1, Tomoaki Okamura, Naomichi Ohashi

  • 1Division of Chemistry, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan. imanishi@chem.es.osaka-u.ac.jp

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