Growth of thin chemically bonded diamondlike films by ion beam deposition

Carbon films with a diamondlike structure that are chemically bonded to surfaces have been deposited by means of low-energy C(+) ion beams. When mass-selected C(+) beams at energies in the range from 20 to 200 electron volts impinge on atomically clean surfaces, the first carbon monolayer grows as a carbide structure that is chemically bonded to the surface. As deposition continues, the structure evolves over the next several atomic layers into a diamondlike structure. These pure carbon films are strongly adhered to the surface through the carbide bonds, which also provide for an intimate interface. There are significant applications for such films, particularly as insulators and doped semiconductors.