Marin Steenackers1, Alexander Küller, Nirmalya Ballav
1Wacker-Lehrstuhl für Makromolekulare Chemie, Technische Universität München, Lichtenbergstr. 4, 85747 Garching, Germany.
You might also read
Articles linked to this work by shared authors, journal, and citation graph.
This study demonstrates precise control over polymer brush layer thickness and morphology using electron-beam chemical lithography to create initiator templates for surface-initiated photopolymerization.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: