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Updated: Jul 10, 2026

11:56
Fluorescence Imaging with One-nanometer Accuracy (FIONA)
Published on: September 26, 2014
157-nm coherent light source as an inspection tool for F(2) laser lithography
Optics Letters
|November 17, 2007
Abstract:
We have developed a 157-nm coherent light source by two-photon resonant four-wave mixing in Xe, with two tunable single-mode 1-kHz Ti:sapphire laser systems at 768 and 681 nm. This light source has been developed to determine the instrumental function of a vacuum ultraviolet spectrometer and to evaluate optical designs for ultra-line-narrowed F(2) laser lithography. The spectral linewidth of the source was less than 0.008 pm (FWHM), with an average power of 0.6 mW.

