Secondary organic aerosol formation from m-xylene in the absence of NOx

Formation of secondary organic aerosol (SOA) from m-xylene photoxidation in the absence of NOx was investigated in a series of smog chamber experiments. Experiments were performed in dry air and in the absence of seed aerosol with H2O2 photolysis providing a stable hydroxyl radical (OH radical) source. SOA formation from this study is exceptionally higher than experiments with existence of NOx. The experiments with elevated HO2 levels indicate that organic hydroperoxide compounds should contribute to SOA formation. Nitrogen oxide (NO) is shown to reduce aerosol formation; the constant aerosol formation rate obtained before addition of NO and after consumption of NO strongly suggests that aerosol formation is mainlythrough reactions with OH and HO2 radicals. In addition, a density of 1.40 +/- 0.1 g cm(-3) for the SOA from the photooxidation of m-xylene in the absence of NOx has been measured, which is significantly higherthan the currently used unit density.