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Frequency-domain interferometric second-harmonic spectroscopy.

P T Wilson, Y Jiang, O A Aktsipetrov

    Optics Letters
    |December 12, 2007
    PubMed
    Summary
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    A novel spectroscopic method measures second-harmonic (SH) radiation

    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Spectroscopy

    Background:

    • Second-harmonic (SH) generation is a key nonlinear optical process.
    • Measuring both intensity and phase of SH radiation is crucial for material characterization.
    • Existing techniques often require laser tuning and are limited in spectral range.

    Purpose of the Study:

    • To develop a new spectroscopic technique for simultaneous intensity and phase measurement of SH radiation.
    • To enable broad spectral range measurements without laser tuning.
    • To characterize the bias-dependent phase of SH radiation from semiconductor devices.

    Main Methods:

    • Utilized a broad-bandwidth 15-fs Ti:sapphire laser to excite two sources of SH radiation.
    • Employed temporally separated SH pulses that interfere in a spectrometer.

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  • Generated frequency-domain interference fringes for analysis.

    • Main Results:

    • Successfully measured the intensity and phase of SH radiation over a broad spectral range.
    • Demonstrated the technique on a Si/SiO(2)/Cr metal-oxide-semiconductor capacitor.
    • Observed strongly bias-dependent phase shifts in the spectral range of the SiE(1) critical point.

    Conclusions:

    • The developed spectroscopic technique offers a powerful tool for nonlinear optical measurements.
    • It allows for comprehensive characterization of materials through SH radiation analysis.
    • Provides new insights into the optical properties of semiconductor devices.