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Published on: December 4, 2014
Influence of substrate treatment on self-organized pattern formation by langmuir-blodgett transfer
Michael Hirtz1, Harald Fuchs, Lifeng Chi
1Physikalisches Institut, Westfälische Wilhelms-Universität, Wilhelm-Klemm-Strasse 10, 48149 Münster, Germany.
Abstract:
Mesoscopic stripe patterns can be obtained by Langmuir-Blodgett (LB) transfer of l-alpha-dipalmitoylphosphatidylcholine (DPPC) onto solid substrates. In order to investigate the influence of substrates on the pattern formation, silicon slides treated by different cleaning processes were taken as model systems. A shift in the transfer pressure range for patterning was observed between plasma- and RCA-treated silicon. This can be explained with a model of equivalent states and taking into account the influence of microscale water films on the substrates.

