Substrate parameter determination for thin film spectrophotometric measurement correction

Area of Science:

• Materials Science
• Optical Physics
• Thin Film Technology

Background:

• Accurate optical characterization of thin films is crucial for various applications.
• Substrate interference can significantly affect thin film spectrophotometric measurements.
• Existing methods may not fully account for complex substrate optical properties.

Purpose of the Study:

• To develop a robust method for extracting accurate optical parameters of thin film substrates.
• To enable precise correction for substrate effects in thin film optical measurements.
• To validate the improved accuracy of thin film data using the derived substrate optical constants.

Main Methods:

• Development of calculations for reflected and transmitted fluxes, incorporating double reflection effects.
• Implementation of a straightforward procedure for fitting experimental measurements.
• Extraction of substrate optical parameters from measured data.

Main Results:

• Accurate optical constants for substrate sets were successfully obtained.
• A significant reduction in substrate influence on thin film measurements was achieved.
• Comparison showed good agreement between corrected thin film measurements and independently calculated data.

Conclusions:

• The described method effectively determines substrate optical parameters.
• Corrected thin film spectrophotometric data demonstrates enhanced accuracy.
• This approach provides a reliable means to mitigate substrate interference in optical thin film analysis.