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High-speed retardation modulation ellipsometer.

A Moritani1, Y Okuda, H Kubo

  • 1Osaka University, Department of Electronic Engineering, Suita, Osaka 565, Japan.

Applied Optics
|August 15, 1983
PubMed
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A new high-speed retardation modulation ellipsometer enables rapid data acquisition for precise optical measurements. This advanced instrument is ideal for studying dynamic processes like anodic film growth on semiconductors.

Area of Science:

  • Materials Science
  • Optical Physics
  • Surface Science

Background:

  • Ellipsometry is a powerful technique for characterizing thin films and surfaces.
  • Traditional ellipsometers can be limited by slow data acquisition speeds, hindering the study of dynamic processes.
  • High-speed optical measurements are crucial for understanding rapid material transformations.

Purpose of the Study:

  • To describe the construction and performance of a novel high-speed retardation modulation ellipsometer.
  • To demonstrate the ellipsometer's capability for rapid data acquisition and precise optical measurements.
  • To showcase its application in studying dynamic surface phenomena.

Main Methods:

  • Utilized an Ammonium Dihydrogen Phosphate (ADP) four-crystal electro-optic modulator for retardation modulation.

Related Experiment Videos

  • Employed a high-speed digitizer for simultaneous detection of transmitted light intensity and modulation voltage.
  • Developed a system capable of acquiring (Psi, Delta) data points in 4 microseconds, with rapid repetition rates.

    • Main Results:

    • Achieved data acquisition for a single (Psi, Delta) data point in just 4 microseconds.
    • Demonstrated high precision with an average root-mean-square error of 0.05 degrees in Psi and 0.15 degrees in Delta using a BaK1 glass standard.
    • Successfully applied the ellipsometer to monitor the rapid growth of anodic films on a Gallium Arsenide (GaAs) semiconductor wafer.

    Conclusions:

    • The developed high-speed retardation modulation ellipsometer offers significant advancements in temporal resolution for ellipsometric measurements.
    • The instrument's precision and speed make it suitable for in-situ monitoring of fast surface and film growth processes.
    • This technology opens new avenues for studying dynamic material behavior in real-time.