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Published on: January 26, 2016
Monitoring the arbitrary thickness of optical thin films and their error simulation: a method
1North China Research Institute of Electro-Optics, P.O. Box 8511, Beijing, China.
Abstract:
This paper was the method of monitoring the absolute value for film layer transmittance to monitor the thickness of optical thin film. For this purpose, a 2S3G double-color three-path monitoring apparatus was built. Simulation analyses of monitoring errors have been conducted and a flow diagram is given. Using this method and apparatus, 9-, 15-, and 23-layer broadband neutral dichroic filters, cold light coatings, edge filters, and polarizers have been plated; good reproducibility and satisfactory results have been obtained, thereby achieving the preparation of the non-lambda/4 multilayer system

