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Analyzing Mixing Inhomogeneity in a Microfluidic Device by Microscale Schlieren Technique
Published on: June 12, 2015
Computer simulation of schlieren images of rotationally symmetric plasma systems: a simple method
1Fraunhofer Institut für Lasertechnik, Drosselweg 87, D-5100 Aachen, Federal Republic of Germany.
Abstract:
Schlieren techniques are commonly used methods for quantitative analysis of cylindrical or spherical index of refraction profiles. Many schlieren objects, however, are characterized by more complex geometries, so we have investigated the more general case of noncylindrical, rotationally symmetric distributions of index of refraction n(r,z). Assuming straight ray paths in the schlieren object we have calculated 2-D beam deviation profiles. It is shown that experimental schlieren images of the noncylindrical plasma generated by a plasma focus device can be simulated with these deviation profiles. The computer simulation allows a quantitative analysis of these schlieren images, which yields, for example, the plasma parameters, electron density, and electron density gradients.
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