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Related Experiment Videos

Linewidth measurement technique using through-focus optical images.

Ravikiran Attota1, Richard Silver, Ronald Dixson

  • 1Precision Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA. ravikiran.attota@nist.gov

Applied Optics
|February 2, 2008
PubMed
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A novel through-focus technique uses optical microscopy to precisely measure critical dimension linewidths. This method analyzes focus-dependent image intensity gradients for nanometer-level accuracy in semiconductor manufacturing.

Area of Science:

  • Optical Metrology
  • Nanoscale Measurement
  • Semiconductor Manufacturing

Background:

  • Accurate critical dimension (CD) linewidth measurement is crucial for semiconductor fabrication.
  • Existing metrology tools can be complex and costly.
  • There is a need for high-sensitivity, cost-effective linewidth measurement techniques.

Purpose of the Study:

  • To introduce and experimentally validate a new through-focus optical microscopy technique for CD linewidth measurement.
  • To demonstrate nanometer sensitivity using a bright field optical microscope.
  • To analyze the focus metric (FM) signature for dimensional information.

Main Methods:

  • Utilizing a bright field optical microscope to capture images of structured targets at varying focus positions.

Related Experiment Videos

  • Analyzing intensity gradients across these through-focus images to generate a focus metric (FM) signature.
  • Employing an array of lines as the structured target for linewidth analysis.
  • Comparing experimental results with simulated data and reference metrology tools (CD-AFM, CD-SEM).

    • Main Results:

    • The through-focus technique generates a complex, distinguishable optical response (FM signature) highly sensitive to target geometry.
    • Multiple FM signature peaks were observed for structured targets due to interfering scattered fields.
    • The technique demonstrated nanometer-level sensitivity in linewidth measurements.
    • Experimental results showed good agreement with simulated data and reference metrology tools.

    Conclusions:

    • The developed through-focus optical microscopy technique offers a sensitive and potentially cost-effective method for CD linewidth metrology.
    • The FM signature analysis provides valuable dimensional information from optical images.
    • This technique shows promise for integration into semiconductor manufacturing quality control.