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High-wavelength-resolution extreme-ultraviolet multilayer mirror.

S Nagata, S Tsuneta, T Sakao

|May 1, 1997

Summary

New multilayer mirrors using silicon carbide and aluminum achieve high wavelength resolution for cosmic plasma diagnostics. This advancement surpasses conventional multilayer mirrors for observing hot astrophysical plasmas.

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Area of Science:

Plasma physics
Astrophysics
Materials science

Background:

High wavelength resolution is crucial for diagnosing cosmic plasmas (1-20 MK).
Current multilayer mirrors face limitations in achieving the required resolution for astrophysical observations.

Purpose of the Study:

To fabricate and characterize a novel multilayer mirror for enhanced cosmic plasma diagnostics.
To achieve a system wavelength resolution (lambda/Dlambda) of 30-50 for observing high-temperature plasmas.

Main Methods:

Fabrication of a multilayer mirror using a silicon carbide reflector (20% layer period thickness) and an aluminum spacer.
Tuning the mirror to a specific wavelength of 284 Angstroms.
Measurement of the mirror's wavelength resolution and peak reflectivity.

Main Results:

Achieved a system wavelength resolution (lambda/Dlambda) of approximately 26.8.
Obtained a peak reflectivity of approximately 13.0%.
The achieved resolution closely matches numerical simulations and significantly exceeds that of conventional Mo/Si multilayer mirrors.

Conclusions:

The novel SiC/Al multilayer mirror demonstrates superior performance for high-resolution cosmic plasma diagnostics.
This technology offers a significant improvement over existing multilayer mirrors for astrophysical applications.
Further development could lead to mirrors meeting the 30-50 resolution requirement.