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Extreme ultraviolet scatterometer: design and capability.

M P Newell, R A Keski-Kuha

    Applied Optics
    |May 1, 1997
    PubMed
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    A new scatterometer measures bidirectional reflectance distribution function (BRDF) at extreme ultraviolet wavelengths. This instrument provides precise scatter measurements for materials like gratings and diamond films.

    Area of Science:

    • Optical Engineering
    • Materials Science
    • Surface Metrology

    Background:

    • Accurate characterization of surface scattering is crucial for optical systems operating in the extreme ultraviolet (EUV) spectrum.
    • Existing instruments may lack the sensitivity or angular range for comprehensive EUV bidirectional reflectance distribution function (BRDF) measurements.
    • Understanding scattering properties of materials like gratings and diamond is vital for developing advanced EUV optics.

    Purpose of the Study:

    • To develop and validate a novel scatterometer for precise BRDF measurements in the extreme ultraviolet (EUV) wavelength range.
    • To characterize the scattering performance of a 3000-line/mm grating and a chemical vapor deposited (CVD) diamond sample.
    • To demonstrate the instrument's capability to measure scatter close to the specular beam with high angular accuracy.

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    Main Methods:

    • Design and construction of a scatterometer optimized for plane-of-incidence BRDF measurements.
    • Operation at extreme ultraviolet wavelengths from 58.4 nm to 121.6 nm.
    • Measurement of scatter angles within 1.5 degrees of the specular beam with angular precision of 0.1 degrees.

    Main Results:

    • Successful development of an EUV scatterometer with a measurement limit of approximately 10(-5) sr(-1).
    • The instrument accommodates angles of incidence from 10 to 75 degrees.
    • Presented BRDF data for a 3000-line/mm grating and a flat CVD diamond sample, showcasing the instrument's performance.

    Conclusions:

    • The developed scatterometer is a capable tool for precise EUV BRDF measurements.
    • The instrument enables detailed analysis of scattering from optical components and materials in the EUV.
    • The presented data provide valuable insights into the surface scattering characteristics of EUV-relevant materials.