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Sub-100 nm patterning of supported bilayers by nanoshaving lithography
Jinjun Shi1, Jixin Chen, Paul S Cremer
1Department of Chemistry, Texas A&M University, P.O. Box 30012, College Station, Texas 77843-3012, USA.
Journal of the American Chemical Society
|February 9, 2008
Summary
Researchers created narrow supported phospholipid bilayers (SLBs) using AFM nanoshaving. Stable SLBs were achieved with a minimum width of 55 nm, determined by adhesion and edge energies.
Area of Science:
- Materials Science
- Nanotechnology
- Biophysics
Background:
- Supported phospholipid bilayers (SLBs) are crucial for biomimetic surfaces.
- Patterning SLBs at the nanoscale is essential for advanced applications.
- Existing methods often lack precise control over SLB dimensions.
Purpose of the Study:
- To develop a method for fabricating sub-100 nm wide supported phospholipid bilayers.
- To determine the minimum stable width of SLBs created by vesicle fusion.
- To investigate the energetic factors limiting SLB width.
Main Methods:
- Utilized Atomic Force Microscopy (AFM)-based nanoshaving lithography.
- Patterned bovine serum albumin (BSA) monolayers on borosilicate substrates.
- Formed SLB lines within BSA-vacated strips via vesicle fusion.
Main Results:
- Achieved controlled patterning of SLBs with widths down to 15 nm.
- Determined a lower size limit of approximately 55 nm for stable SLBs.
- Identified a balance between bilayer adhesion and edge energies as the limiting factor.
Conclusions:
- AFM nanoshaving enables precise fabrication of nanoscale SLBs.
- SLB stability is governed by a trade-off between adhesion and edge energies.
- This technique offers a pathway for creating defined nanostructures for biological interfaces.
